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Samsung 3 nm process

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Samsung 3 nm process
NameSamsung 3 nm process
DeveloperSamsung Electronics
Introduced2022
Design rulesFinFET / GAAFET transition
ApplicationsSystem on Chip, SoC, mobile processors, AI accelerators

Samsung 3 nm process

The Samsung 3 nm process is a third-generation semiconductor node developed by Samsung Electronics as a successor to its 5 nm process node, intended for advanced mobile processors, system on chips and accelerators. It represents a transition in transistor architecture and manufacturing techniques aimed at improving power efficiency, performance, and logic density for products competing in markets served by Apple Inc., Qualcomm Incorporated, NVIDIA Corporation, Advanced Micro Devices, Intel Corporation, and MediaTek Inc..

Overview

Samsung's 3 nm effort follows a lineage of nodes including 10 nm process, 7 nm process, and 5 nm process, and competes with nodes from TSMC and Intel. The node was developed by Samsung's Device Solutions division and fabricated primarily at manufacturing sites such as the Giheung and Hwaseong complexes in South Korea. Development involved collaborations across Samsung's supply chain with equipment vendors like ASML, Lam Research, KLA Corporation, Applied Materials, and materials suppliers such as SUMCO Corporation and Shin-Etsu Chemical Co., Ltd..

Technology and Process Features

Samsung's 3 nm node introduced a shift from FinFET to gate-all-around transistor architectures similar to GAAFET concepts, incorporating nanosheet or nanowire multi-stack channels inspired by academic research from institutions like IMEC and Tsinghua University. The process uses extreme ultraviolet lithography pioneered by ASML's EUV tools, with multiple EUV patterning layers and immersion lithography ties to Nikon Corporation tools. Backend integration leverages advances in chemical mechanical planarization and through-silicon via techniques associated with 3D integration work at organizations such as JEDEC Solid State Technology Association and SEMATECH. Process control and yield ramp efforts used metrology from Hitachi High-Tech Corporation and inspection tools from Onto Innovation.

Manufacturing Timeline and Rollout

Samsung announced development milestones in the late 2010s and early 2020s, with pilot production ramps reported around 2021–2022 and wider production through 2023–2024. Announcements and roadmap updates were often presented at industry events like SEMICON West, ISSCC, and IEDM. Mass production and customer qualification cycles involved partners such as Google LLC for tensor accelerators, Apple Inc. for mobile SoCs (where applicable), and various fabless companies including Qualcomm Incorporated and MediaTek Inc. seeking advanced nodes. The rollout intersected with supply chain dynamics influenced by geopolitical factors involving South Korea and trade relationships with United States and Taiwan.

Products and Applications

Products leveraging Samsung's 3 nm technology include flagship smartphone SoCs, mobile GPUs, and domain-specific accelerators for artificial intelligence and machine learning workloads designed by companies like Samsung Electronics (Device Solutions), Qualcomm Incorporated, and niche accelerator startups. Use cases extend to high-performance computing modules in data centers from vendors such as Amazon Web Services, Microsoft Azure, and Google Cloud Platform when integrating custom silicon. The node supports integration of advanced modems, imaging processors used by Sony Corporation camera divisions, and components for automotive systems developed by suppliers like Bosch and Continental AG.

Performance, Power, and Density

Samsung marketed the 3 nm node as offering improvements in power consumption, speed, and transistor density compared to 5 nm, with laboratory claims referencing percentage gains in performance-per-watt. Benchmarks and design metrics compared Samsung's 3 nm results to contemporaneous nodes from TSMC and Intel Corporation, with independent analyses from industry observers such as TechInsights and Cadence Design Systems providing corroborating designs. Physical scaling benefits depended on design libraries from Synopsys and Mentor Graphics (now part of Siemens) and process design kits used by customers like Apple Inc. and Qualcomm Incorporated.

Comparisons and Market Position

In the competitive landscape, Samsung's 3 nm node contended with TSMC's 3 nm offerings and Intel's roadmap. Market share outcomes were influenced by factors including yield, cost per wafer, customer relationships with Apple Inc. and NVIDIA Corporation, and capacity expansions in facilities such as Samsung's Pyeongtaek complex and TSMC's fabs in Taiwan. Industry reports by Gartner and IC Insights charted adoption rates, while strategic corporate moves echoed actions by Broadcom Inc. and AMD when selecting foundry partners.

Challenges and Future Development

Challenges for Samsung's 3 nm development included achieving competitive yields, managing capital expenditure, and addressing technical hurdles in lithography and transistor variability noted in publications from IEEE conferences and research from IMEC. Supply chain constraints involved equipment lead times from ASML and materials sourcing issues involving companies like SUMCO Corporation. Looking ahead, Samsung signaled further development toward sub-3 nm and enhanced GAAFET evolutions, coordinating with industry roadmaps such as those outlined by International Roadmap for Devices and Systems contributors and regional technology initiatives in South Korea and European Union.

Category:Semiconductor fabrication processes