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gallium arsenide

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gallium arsenide
Namegallium arsenide
IUPAC nameGallium arsenide
Other namesGallium monoarsenide
CAS No1303-00-0
EINECS No215-114-8
PubChem14770
ChemSpiderID Refcorrect, chemspider
ChemSpiderID14088
UNII Refcorrect, FDA
UNII3J421F73DV
RTECS NoLW8800000

gallium arsenide. It is a compound of the elements gallium and arsenic, forming a III-V semiconductor with a zincblende crystal structure. This material possesses superior electronic properties compared to silicon, including a higher electron mobility and a direct band gap, making it indispensable for specialized optoelectronic and high-frequency devices. Its development was propelled by research at institutions like Bell Labs and has become critical in technologies from satellite communications to advanced radar systems.

Properties

Gallium arsenide exhibits a crystal lattice isostructural with diamond, but with alternating gallium and arsenic atoms. It has a direct band gap of approximately 1.42 eV at room temperature, which is ideal for efficient light emission and absorption. The material's high electron mobility and saturated electron velocity significantly exceed those of silicon, enabling faster transistor operation. Its thermal conductivity is lower than that of silicon, which presents challenges for heat dissipation in dense circuits. Notable properties also include its refractive index and transparency in the infrared spectrum, utilized in optoelectronics.

Production and synthesis

High-purity gallium arsenide is primarily produced using the Liquid-encapsulated Czochralski process, a method adapted from silicon crystal growth that involves pulling a seed crystal from a molten stoichiometric melt under an inert boron oxide layer. Alternative techniques include the Bridgman–Stockbarger technique and Metalorganic vapour-phase epitaxy for depositing thin epitaxial layers on substrates. The raw materials, gallium and arsenic, are highly purified, often sourced as by-products from the processing of bauxite and copper ores. Major producers include companies like Freiberger Compound Materials and AXT, Inc..

Applications

Due to its superior high-frequency performance, gallium arsenide is the substrate of choice for MMICs used in radar systems, satellite communications, and cellular infrastructure like 5G networks. Its direct band gap makes it fundamental to optoelectronic devices, including laser diodes for CD and DVD readers, LEDs, and solar cells for space applications like those on the Hubble Space Telescope. It is also used in specialized HEMTs and HBTs for advanced RF designs.

Safety and environmental considerations

The primary hazard associated with gallium arsenide is the toxicity of arsenic, a known human carcinogen regulated by agencies like the Occupational Safety and Health Administration. Dust from wafer sawing or polishing requires stringent controls to prevent inhalation. Environmental concerns focus on the disposal of manufacturing waste and end-of-life electronic components, which may leach arsenic into groundwater. Recycling processes are complex, prompting research into safer alternative compounds like indium phosphide or gallium nitride for some applications. Regulations such as the Restriction of Hazardous Substances Directive influence its use in consumer goods.

History and development

The semiconductor potential of III-V compounds was recognized in the early 1950s, with key foundational work conducted at Bell Labs. The first gallium arsenide laser diode was demonstrated in 1962 by teams at General Electric, IBM, and Lincoln Laboratory, following the invention of the semiconductor laser. Its development was heavily funded by the United States Department of Defense for applications in radar and missile guidance systems. The 1980s and 1990s saw its commercialization accelerate with the growth of the mobile phone and optoelectronic industries, cementing its role in modern technology.

Category:Semiconductors Category:Gallium compounds Category:Arsenic compounds